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Substrate Innovation for extending Moore and More than Moore law

机译:扩展摩尔定律和摩尔定律以外的基板创新

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Within last 10 years, end markets drastically changed towards mobile connected users. With 8B smartphones to be shipped next 4 years, typical performance/cost KPIs have been evolved towards more demanding PPAC metrics adding power consumption (battery life) and area (from factors) constraints. In this effort to bring more performance, less power or more functionality, innovation or evolution starting from substrates has demonstrated significant successes, such as FDSOI for extension of Moore's law beyond 28nm node. In the field of front end modules (FEM) for smartphones, switch, previously built on AsGa substrates, are now built on RFSOI substrates. Compared to 150mm AsGa wafers, 200mm RFSOI wafers are silicon family wafers and FEM switch are now built in large volume in most foundries, offering very significant die cost advantage. This example can be reproduced for many other application fields or device options where substrate innovation is supporting major improvements.
机译:在过去的10年中,终端市场急剧转向了移动连接用户。随着8B智能手机将在未来4年内交付,典型的性能/成本KPI已向更加苛刻的PPAC指标发展,从而增加了功耗(电池寿命)和面积(受因素影响)的限制。为了带来更高的性能,更少的功耗或更多的功能,从基板开始的创新或发展已取得了巨大的成功,例如FDSOI将摩尔定律扩展到了28nm以上。在智能手机的前端模块(FEM)领域,以前基于AsGa基板构建的开关现在基于RFSOI基板构建。与150mm AsGa晶圆相比,200mm RFSOI晶圆是硅系列晶圆,而FEM开关现在已在大多数铸造厂中大量生产,从而提供了非常显着的管芯成本优势。该示例可以复制到许多其他应用领域或设备选项中,其中基板创新正在支持重大改进。

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