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Investigating the ArF laser stability of CaF_2 at elevated fluences

机译:研究高通量下CaF_2的ArF激光稳定性

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Combined measurements of transmission T, absorption A and total scattering TS revealed the high accuracy of all applied measurement techniques by obtaining a sum T+A+TS+R = (100±0.3)% (R denotes the Fresnel reflection). In order to investigate CaF_2 at high fluences, a variety of samples from high purity excimer grade to research grade was irradiated (80 ... 150 mJ/cm~2, 2*10~6...7*10~6 pulses) and characterized before and after irradiation by total scattering, laser induced fluorescence (LIF) and transmission measurements. Total scattering mappings showed negligible and measurable scattering in excimer grade and some research samples of minor purity, respectively. For the first time to our knowledge, laser induced fluorescence measurements revealed increasing (580nm, 740 nm) as well as decreasing (313 nm, 333 nm) emissions. The small increases of the linear absorption, obtained in all samples by transmission measurements, were used to distinguish high from minor quality material. For high quality samples the linear absorption change scales with NH~3 (N: number of pulses), whereas for minor quality research samples a NH~2-scaling was found.
机译:透射率T,吸收率A和总散射TS的组合测量通过获得总和T + A + TS + R =(100±0.3)%(R表示菲涅耳反射),揭示了所有应用测量技术的高精度。为了研究高通量的CaF_2,从高纯度准分子级到研究级的各种样品被照射(80 ... 150 mJ / cm〜2,2 * 10〜6 ... 7 * 10〜6个脉冲)并通过总散射,激光诱导荧光(LIF)和透射率测量对辐照前后进行表征。总散射图显示,准分子级和一些纯度较小的研究样品的散射可忽略不计。据我们所知,激光诱导的荧光测量首次显示出增加的(580nm,740 nm)和减少的(313 nm,333 nm)发射。通过透射测量在所有样品中获得的线性吸收的小幅增加,用于区分高品质材料和次品。对于高质量样品,线性吸收变化与NH〜3(N:脉冲数)成比例,而对于次要质量研究样品,则发现NH〜2结垢。

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