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Plasma self-bias and ion acceleration in the madhex helicon source

机译:madhex Helicon源中的等离子体自偏压和离子加速

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= 4.5) with an axial magnetic field, variable up to 1.2 kG at the source region that can be operated in flat or nozzle field configurations. An 18 cm long, 12 cm diameter half-turn double-helix antenna is used to excite helicon waves in the source. A new double magnetic mirror and an additional magnetic coil placed between the transition region between plasma source and expansion chamber are used to increase plasma ionization rate and reduce ion-electron recombination and neutral reflux in the expansion region. The effect of RF power, magnetic field strength and gas flow rate on the plasma parameters including electron temperature, density, plasma potential and ion beam acceleration are explored by probe diagnostics (Langmuir probe, emissive prove and retarding potential analyzer) and non-invasive optical techniques (laser induced fluorescence and optical emission spectroscopy). The role of substantial RF fluctuations in the plasma potential and the upstream end-plate boundary condition are addressed. The effect of the electron energy distribution that may include substantial tails on plasma self-bias and the ion beam formation and acceleration is examined by optical emission spectroscopy and cross-checked with the results via using a retarding potential analyzer. Also, its effect o- the ion energy distribution is verified by using argon 668 nm laser induced fluorescence.
机译:= 4.5)的轴向磁场,在源区域可变化高达1.2 kG,可以在平面或喷嘴场配置中运行。 18厘米长,12厘米直径的半圈双螺旋天线用于激发源中的螺旋波。在等离子体源和膨胀室之间的过渡区域之间放置了一个新的双磁镜和一个额外的电磁线圈,以提高等离子体的电离速率并减少膨胀区域中的离子电子复合和中性回流。通过探针诊断(Langmuir探针,发射证明和延迟电位分析仪)和非侵入性光学技术,探索了射频功率,磁场强度和气体流速对等离子体参数(包括电子温度,密度,等离子体电势和离子束加速度)的影响。技术(激光诱导荧光和光发射光谱)。解决了等离子体电位和上游端板边界条件中大量RF波动的作用。通过光发射光谱法检查可能包含大量尾巴的电子能量分布对等离子体自偏压以及离子束形成和加速度的影响,并使用延迟电势分析仪对结果进行交叉检查。同样,通过使用氩668 nm激光诱导的荧光验证了其对离子能量分布的影响。

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