Gyrokinetic modeling of magnetized technical plasmas

摘要

Many technical plasma processes, like magnetically enhanced reactive ion etching (MERIE), plasma ion assisted deposition (PIAD), and conventional and high-power impulse magnetron sputtering (dcMS/HiPIMS) employ (partially) magnetized high density plasmas at relatively low pressures. (Typical values are p∼0.01–1 Pa, B∼10–100 mT, n