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Intrinsic Diffusion in Ni_3AI

机译:Ni_3AI中的固有扩散

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Intrinsic diffusion coefficients of Al and Ni in Ni_3Al are determined using Ni/NiAl couples. The composition of the NiAl is controlled so that the Kirkendall interface is present in the Ni_3Al phase formed in the couple. Concentration profiles are measured across the interface and interdiffusion coefficients of Ni_3Al are determined from the profiles using the Sauer-Freise technique. The Darken's equation is applied for the determination of the intrinsic diffusion coefficients. It is shown that the intrinsic diffusion coefficients of Al and Ni in Ni_3Al are in almost the same magnitude. The self-diffusion coefficients of Al and Ni in Ni_3A1 are also estimated using the Manning equation. The present results are consistent with the diffusion mechanisms considering anti-site defects.
机译:使用Ni / NiAl对确定Ni_3Al中Al和Ni的本征扩散系数。控制NiAl的成分,使Kirkendall界面存在于成对的Ni_3Al相中。在界面上测量浓度分布,并使用Sauer-Freise技术根据分布确定Ni_3Al的互扩散系数。 Darken方程用于确定本征扩散系数。结果表明,Ni_3Al中Al和Ni的本征扩散系数几乎相同。 Ni_3A1中Al和Ni的自扩散系数也使用Manning方程估算。目前的结果与考虑抗位缺陷的扩散机制是一致的。

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