Aberration measurement of fast pulse generators using sampling oscilloscopes

摘要

The definition, measurement, and traceability of aberrations in pulse waveform metrology is discussed. The use of reference waveforms and masks allows the definition of aberrations within specific regions relative to the transition point of a pulse generator, as desired by manufacturers and users. Of particular importance is the definition of aberrations for specific bandwidths, often required by the end user. An attempt has been made to identify anomalous structure and its source, whether in the oscilloscope or pulse generator. By using the information obtained it is now possible to correct a pulse generator waveform to a much more realistic shape and with a better correspondence to dc amplitude calibration values.