Ultraflat Nanosphere Lithography: A New Method to Fabricate Flat Nanostructures

摘要

We report a new nanofabrication technique, ultraflat nanosphere lithography (UNSL), in which we have combined two existing methods, nanosphere lithography (NSL) and ultraflat template stripping, to create ultraflat nanopatterned surfaces. In UNSL, a material is deposited onto mica though a mask created by a close-packed monolayer of nanospheres, and, after removal of the spheres, a second material is deposited on the nanostructures. Subsequently, upon removing the mica, the surface in contact with the mica reveals flat nanostructures of the first material embedded in a matrix of the second deposited material.