Low cost high quality fabrication methods and cad for diffractive optics and computer holograms compatible with micro-electronics and micro-mechanics fabrication

摘要

State-of-the-art diffractive optical elements (DOEs) and computer generated holograms (CGHs) are fabricated using e-beam lithography and dry etching techniques to achieve multi-levle phase elements with very high diffraction efficiencies. Electron beam lithography allwos DOEs/CGHs with smaller feature sizes (e.g. for off-axis diffractive lenses with small f-number) to be fabricated. Dry etching techniques, especially chemically assisted reactive ion beam, allows DOEs/CGHs be fabricated in a variety of materials.