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An universal method to optimize shrunken distance of the step plate Tseng, Yun-Chieh

机译:优化台阶板缩距的通用方法曾允杰

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摘要

In PVD (Physical Vapor Deposition) process, this study mainly exhibits an innovatively designing approach of thin film micro-control which the Dummy Plate of Step type and the proportional of step structure (h/d) were optimized to attain reasonable Guard band. The optimized approach can effectively reduce the film deposition to avoid shell-like defect and significantly improve the effect of the crystal defect on the wafer backside.
机译:在PVD(物理气相沉积)过程中,本研究主要展示了一种创新的薄膜微控制设计方法,该方法优化了阶梯型虚拟板和阶梯结构的比例(h / d),以获得合理的保护带。优化的方法可以有效地减少薄膜沉积,避免出现壳状缺陷,并显着提高晶体缺陷对晶片背面的影响。

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