Structure and properties of Ti-Al-Y-N coatings deposited from filtered cathodic-arc plasma in gas Ar and N2 mixture

摘要

The results of studies of the structure and stress state of Ti-Al-Y-N coatings deposited by the PIII & D method from a filtered vacuum arc plasma under conditions of supplying a pulsed substrate bias potential at an amplitude of 1.5 kV are presented. X-ray diffraction analysis was used to study the influence of argon additives in the range of 0 to 30% to nitrogen on the characteristics of coatings. It is established that, regardless of the argon concentration in the gas mixture, the coatings have nearly close elemental composition and a nanocrystalline structure of the cubic solid solution (Ti, Al)N (structural type NaCl) with a biaxial texture [110] and [100]. As the argon content increases, the columnar microstructure and the size of the nitride crystallites in the coatings are retained, the level of compressive stresses changes nonmonotonically in the range of 6-8 GPa, and the hardness of the coatings remains at a high level of 32-34 GPa.