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Development of NTD Ge sensors for low temperature thermometry

机译:用于低温测温的NTD Ge传感器的开发

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The development of NTD Ge sensors for use in cryogenic bolometric detector to search for neutrinoless double beta decay (Ovßß) in 124Sn is reported. The samples made from device grade Ge wafers are irradiated with thermal neutrons at Dhruva reactor, Bhabha Atomic Research Centre (BARC), Mumbai. The carrier concentration in irradiated Ge samples is estimated by Hall effect measurement at 77K. The fast neutron induced defects are studied using Positron Annihilation Lifetime Spectroscopy and Channeling. It is found that vacuum annealing of the samples at 600°C for 2 hours is necessary to cure the defects. Sensors are made from annealed NTD samples using Au-Ge Ohmic contact. Preliminary measurements have shown a significantly large dR/dT ~ 2.3 kΩ/mK at 100 mK. Details of these measurements are presented.
机译:据报道,NTD Ge传感器用于低温辐射热探测器中的开发,可用于搜索124Sn中的无中微子双β衰变(Ovßß)。由设备级Ge晶片制成的样品在孟买Bhabha原子研究中心(BARC)的Dhruva反应堆中用热中子辐照。 Ge样品中的载流子浓度通过霍尔效应测量在77K下估算。使用正电子An没寿命光谱学和通道研究了中子引起的快速缺陷。已经发现,将样品在600℃下真空退火2小时对于固化缺陷是必要的。传感器由退火的NTD样品使用Au-Ge Ohmic接触制成。初步测量显示,在100 mK时,dR / dT很大,约为2.3kΩ/ mK。提供了这些测量的详细信息。

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