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Porous silicon nanowire arrays with excellent antireflection property

机译:具有优异抗反射性能的多孔硅纳米线阵列

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摘要

Light trapping enhancement by porous silicon nanowire (SiNW) arrays were reported.Porous SiNW arrays were fabricated by an improved metal-assisted chemical etching method.A mechanism of Ag nanoparticles-induced silicon nanowires etching was proposed to explain nanopores formation.The obtained porous SiNW arrays exhibit excellent antireflection property of below 2% in the wavelength range of 300-1000nm,which can be applicable to solar cells.
机译:报道了通过多孔硅纳米线(SiNW)阵列增强光捕获的能力,通过改进的金属辅助化学刻蚀方法制造了多孔SiNW阵列,提出了一种由Ag纳米粒子诱导的硅纳米线刻蚀的机理来解释纳米孔的形成。阵列在300-1000nm的波长范围内表现出优异的抗反射性能,低于2%,可用于太阳能电池。

著录项

  • 来源
  • 会议地点 Chengdu(CN)
  • 作者单位

    School of Materials Science and Engineering, Harbin Institute of Technology;

    State Key Laboratory of Alternate Electrical Power System with Renewable Energy Sources, North China ElectricPower University;

    State Key Laboratory of Alternate Electrical Power System with Renewable Energy Sources, North China ElectricPower University;

    State Key Laboratory of Alternate Electrical Power System with Renewable Energy Sources, North China ElectricPower University;

    State Key Laboratory of Alternate Electrical Power System with Renewable Energy Sources, North China ElectricPower University;

    State Key Laboratory of Alternate Electrical Power System with Renewable Energy Sources, North China ElectricPower University;

    State Key Laboratory of Alternate Electrical Power System with Renewable Energy Sources, North China ElectricPower University;

    State Key Laboratory of Alternate Electrical Power System with Renewable Energy Sources, North China ElectricPower University;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 TB346;
  • 关键词

    Light trapping; Porous SiNW arrays; Metal-assisted chemical etching;

    机译:陷光;多孔SiNW阵列;金属辅助化学蚀刻;;

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