首页> 外文会议>2013 IEEE International Interconnect Technology Conference >Numerical simulations of high heat dissipation technology in LSI 3-D packaging using carbon nanotube through silicon via (CNT-TSV) and thermal interface material (CNT-TIM)
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Numerical simulations of high heat dissipation technology in LSI 3-D packaging using carbon nanotube through silicon via (CNT-TSV) and thermal interface material (CNT-TIM)

机译:碳纳米管通过硅过孔(CNT-TSV)和热界面材料(CNT-TIM)的LSI 3-D封装中高散热技术的数值模拟

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We report numerical simulations of heat dissipation properties of nano-carbon through silicon via (TSV), thermal interface material (TIM), and chip package towards a high heat dissipation LSI 3-D packaging. By using vertically aligned multi-walled CNTs (MWNTs) as both TSV and TIM materials and graphite as chip package, a boundary temperature just under a heat source decreased 40.8K in total, comparing to that using conventional materials. This result suggests superior heat dissipation properties of nano-carbon 3-D packaging.
机译:我们报告了通过硅通孔(TSV),热界面材料(TIM)和芯片封装朝着高散热LSI 3-D封装的纳米碳散热性能的数值模拟。通过使用垂直排列的多壁CNT(MWNT)作为TSV和TIM材料,并使用石墨作为芯片封装,与使用传统材料相比,仅在热源下的边界温度总共降低了40.8K。该结果表明纳米碳3-D封装具有优异的散热性能。

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