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Measurement of MMIC gate temperature using infrared and Thermoreflectance thermography

机译:使用红外和热反射热成像技术测量MMIC栅极温度

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Thermal characterization of high power microwave devices is important for determining their reliability. Exceeding the optimal temperature will have a detrimental effect on the performance and reliability of these devices. In this paper, the temperature a power amplifier (PA) Monolithic Microwave Integrated Circuit (MMIC) was measured using the traditional Infrared (IR) thermography technique and an emerging technique called Thermoreflectance (TR) thermography. The measured results were compared to those calculated using finite element analysis (FEA). It was found that temperatures measured using TR thermography agreed very well with FEA results, whereas temperatures measured using IR thermography did not. This could be attributed to the presence of reflective and low emissivity surfaces on the PA MMIC and the inadequate spatial resolution of the IR camera.
机译:高功率微波设备的热特性对于确定其可靠性很重要。超过最佳温度将对这些设备的性能和可靠性产生不利影响。在本文中,功率放大器(PA)单片微波集成电路(MMIC)的温度是使用传统的红外(IR)热成像技术和一种新兴的称为热反射(TR)热成像技术来测量的。将测量结果与使用有限元分析(FEA)计算的结果进行比较。发现使用TR热成像仪测量的温度与FEA结果非常吻合,而使用IR热成像仪测量的温度却不完全相同。这可能是由于PA MMIC上存在反射和低发射率的表面,以及IR摄像机的空间分辨率不足所致。

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