首页> 外文会议>2012 Abstracts 39th IEEE International Conference on Plasma Science. >The flowing afterglow of the N2-O2 discharge as a means of decontaminating/sterilising through UV irradiation: Summary of the research achieved and recent results
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The flowing afterglow of the N2-O2 discharge as a means of decontaminating/sterilising through UV irradiation: Summary of the research achieved and recent results

机译:N 2 -O 2 放电的流动余辉,作为通过紫外线照射进行消毒/杀菌的手段:已完成的研究和最新成果的摘要

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摘要

The plasma systems for disinfection/sterilization that we have been working on are mainly based on UV irradiation while most plasma “sterilisers” are calling on ions and radicals. In the latter case, inactivation generally proceeds from erosion of the microorganisms while, in the former case, the UV photons create enough lesions to the DNA genetic material to prevent its repair. Inactivation of microorganisms through UV photons in the afterglow is, however, much slower than in the discharge itself. The UV photons stem from NO excited molecules, which are generated following the interaction of N and O atoms, in the flowing afterglow, which are coming from the dissociation of N2 and O2 in the (microwave) discharge. Since the N and O atoms can diffuse into crevices before joining into NO molecules, there is no limited accessibility of the UV photons as with a UV lamp. The NOγ molecular system shows band heads that cover almost continuously the 180–350 nm range.
机译:我们一直在研究的用于消毒/灭菌的等离子体系统主要基于紫外线辐射,而大多数等离子体“灭菌器”则要求离子和自由基。在后一种情况下,失活通常是由于微生物的侵蚀而引起的,而在前一种情况下,紫外线光子会对DNA遗传物质产生足够的损害,以防止其修复。但是,在余辉中通过紫外线光子灭活微生物要比放电本身慢得多。紫外线光子源自NO激发的分子,该分子是在流动的余辉中随着N和O原子的相互作用而产生的,这些余辉来自N2和O2在(微波)放电中的分解。由于N和O原子在加入NO分子之前可以扩散到缝隙中,因此与UV灯一样,UV光子的可访问性不受限制。 NOγ分子系统显示的带头几乎连续覆盖180-350 nm范围。

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