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Two-layered thin carrier-attached copper foil

机译:两层薄载体附铜箔

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摘要

A method for making thin copper foil attached carrier was developed without additional release layer on carrier in this study. The carrier copper foil was two-layered structure, carrier and copper foil, which was different from the traditional three-layered. Copper is directly electrodeposited on certain carriers which have spontaneous and conductive oxides formed on surface. The oxides will be utilized as a release layer. The two-layer structured carrier copper foil showed releasable capability after annealed at 400°C for 2 hours. The high temperature release performance of the interface was also studied for making 2L-FCCL by PI casting process. It showed that the interface was releasable and the release peel strength was averagely less than 40gf/cm after PI casting process with at least 1hour of curing at temperature higher than 360°C. Moreover, the etching residues were identified with EDX mapping and no copper component was found at the space area.
机译:在这项研究中,开发了一种制造附有铜箔的薄载体的方法,该方法无需在载体上附加剥离层。载体铜箔为两层结构,载体和铜箔,不同于传统的三层。铜直接电沉积在某些具有表面自发和导电氧化物的载体上。氧化物将被用作脱模层。两层结构的载体铜箔在400℃下退火2小时后显示出可剥离的能力。还研究了通过PI铸造工艺制备2L-FCCL界面的高温释放性能。结果表明,在高于360°C的温度固化至少1小时后,PI浇铸后界面可释放,剥离剥离强度平均小于40gf / cm。此外,通过EDX映射确定了蚀刻残留物,并且在空白区域未发现铜成分。

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