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Full adder design with GDI cell and independent double gate transistor

机译:具有GDI单元和独立双栅极晶体管的完整加法器设计

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This paper proposes 1 bit full adder using double-gate FinFet transistor and Gate Diffusion Input (GDI) technique. Using GDI cell makes it possible to reduce the number of transistors and merging this technique with double gate process causes further reduction in power and delay. Although, double gate transistors with independent gates are the choice for low power design, we use both dependent and independent gates in proposed circuit to achieve lower power. This issue is related to GDI cell properties which is discussed in more details in this paper. Simulations are performed on 45nm providing a sub-circuit model for FinFET from PTM and 1V supply voltage. According to our simulation result, the proposed full adder is better than prior designs in terms of power and power*delay.
机译:本文提出了一种使用双栅极FinFet晶体管和栅极扩散输入(GDI)技术的1位全加器。使用GDI单元可以减少晶体管的数量,并且将该技术与双栅极工艺相结合会进一步降低功耗和延迟。尽管具有独立栅极的双栅极晶体管是低功耗设计的选择,但我们在拟议的电路中同时使用了独立栅极和独立栅极来实现较低功耗。此问题与GDI单元属性有关,本文将对其进行详细讨论。在45nm上进行仿真,提供了基于PTM和1V电源电压的FinFET子电路模型。根据我们的仿真结果,在功率和功率*延迟方面,拟议的全加器优于现有设计。

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