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Low-frequency 1/f noise in bismuth selenide Topological Insulators

机译:硒化铋拓扑绝缘子的低频1 / f噪声

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Topological insulators is a newly discovered class of materials with the Dirac cone type dispersion at the surface and conventional band in the volume of the material. We present results of the study of the low-frequency excess noise in thin films made of Bi2Se3 topological insulator material. The films were prepared through mechanically cleavage from the bulk crystal via the “graphene-like” exfoliation procedure. We verified the quality and crystallinity of Bi2Se3 samples with the micro-Raman spectroscopy. Our fabricated devices have linear current voltage characteristics in the low bias region with the current fluctuation noise spectral density SI proportional to 1/f for frequency f less than 10 kHz. The noise spectral density SI showed the square law dependence on the source-drain current and changed from about ∼10−22 to 10−18 A2/Hz as current changes form ∼10−7 to 10−5 A. Our results can be used for understanding electron transport and trap dynamics, and for reducing low-frequency noise in topological insulator devices.
机译:拓扑绝缘体是一类新发现的材料,其表面具有狄拉克锥型分散体,并且在材料体积中具有常规带。我们介绍了由Bi 2 Se 3 拓扑绝缘体材料制成的薄膜中的低频过量噪声的研究结果。通过“类石墨烯”剥落程序从大块晶体上机械裂解制备薄膜。我们用微拉曼光谱法验证了Bi 2 Se 3 样品的质量和结晶度。我们制造的器件在低偏置区域具有线性电流电压特性,对于频率f小于10 kHz,电流波动噪声频谱密度SI与1 / f成比例。噪声频谱密度SI显示出平方律与源漏电流的关系,并且从约10 −22 变为10 −18 A 2 / Hz,因为电流变化从〜10 −7 到10 −5 A。我们的结果可用于理解电子传输和陷阱动力学,以及用于降低低频拓扑绝缘子设备中的噪声。

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