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Device modeling with NVNAs and X-parameters

机译:使用NVNA和X参数进行设备建模

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摘要

This paper reviews and contrasts two complementary device modeling approaches based on data readily obtainable from a nonlinear vector network analyzer (NVNA) [1]. The first approach extends the application of waveform data to improve the characterization, parameter extraction, and validation methodologies for “compact” transistor models. NVNA data is used to train artificial neural network -based constitutive relations depending on multiple coupled dynamic variables, including temperature and trap states for an advanced compact model suitable for GaAs and GaN transistors. The second approach is based on load-dependent X-parameters* [2], [3], [5], [6], measured using an output tuner working with the NVNA. It is demonstrated that X-parameters measured versus load at the fundamental frequency predict well the independent effects of harmonic load tuning on a 10W GaN packaged transistor without having to independently control harmonic loads during characterization. A comparison of the respective merits of the two approaches is presented.
机译:本文回顾并对比了基于可从非线性矢量网络分析仪(NVNA)轻松获得的数据的两种互补设备建模方法[1]。第一种方法扩展了波形数据的应用,以改善“紧凑”晶体管模型的特性,参数提取和验证方法。 NVNA数据用于训练神经网络的本构关系,取决于多个耦合的动态变量,包括适用于GaAs和GaN晶体管的高级紧凑模型的温度和陷阱状态。第二种方法基于与负载有关的X参数* [2],[3],[5],[6],这些参数是使用与NVNA配合使用的输出调谐器测量的。结果表明,在基频下测得的X参数与负载之间的关系可以很好地预测谐波负载调谐对10W GaN封装晶体管的独立影响,而不必在表征期间独立控制谐波负载。比较了两种方法各自的优点。

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