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Temperature and humidity effects on the stability of on-plastic a-Si:H thin film transistors with various conduction channel layer thicknesses

机译:温度和湿度对不同导电沟道层厚度的塑料a-Si:H薄膜晶体管稳定性的影响

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摘要

Stability is an important issue for the application of TFTs. In this paper, we present the effects of humidity and temperature on the stability of inverted-staggered back-channel-cut a-Si:H TFTs with various conduction channel layer thicknesses. We evaluated the stability of on-plastic TFTs of different conduction layer thicknesses made at a process temperature of 150℃ on 51-μm thick Kapton polyimide foil substrates. With conduction channel layer thickness of 50nm, humidity reversibly varies the characteristics of TFTs, but TFTs of conduction layer thickness greater than 100 nm are pretty immune to the humidity change. The temperature dependent stability and characteristics of TFTs were analyzed from 20℃ to 60℃. Rising temperature from 20℃ to 56℃, the threshold voltage (V_t) drops about 2 volts; on-off current ratio decreases by one order of magnitude mainly due to thermally excited carriers in the off-region.
机译:稳定性是TFT应用的重要问题。在本文中,我们介绍了湿度和温度对具有不同导电沟道层厚度的反向交错反向切割的a-Si:H TFT稳定性的影响。我们评估了在51微米厚的Kapton聚酰亚胺箔基板上在150℃的工艺温度下制造的不同导电层厚度的塑料TFT的稳定性。在传导沟道层厚度为50nm的情况下,湿度可逆地改变TFT的特性,但是传导层厚度大于100 nm的TFT几乎不受湿度变化的影响。在20℃至60℃的温度范围内分析了TFT的温度稳定性和特性。将温度从20℃升高到56℃,阈值电压(V_t)下降约2伏;通断电流比降低一个数量级,这主要是由于在关断区域中的热激发载流子所致。

著录项

  • 来源
  • 会议地点 San Francisco CA(US)
  • 作者

    Jian Z Chen; I-Chun Cheng;

  • 作者单位

    Institute of Applied Mechanics, National Taiwan University, No.1 Sec.4 Roosevelt Rd., Taipei, 10617, Taiwan;

    rnDepartment of Electrical Engineering and Graduate Institute of Photonics and Optoelectronics, National Taiwan University, No.l Sec.4 Roosevelt Rd., Taipei, 10617, Taiwan;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学 ;
  • 关键词

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