Formation of Aluminum Nano-Dot Array by The Use of Nano-indentation and Anodic Oxidation

摘要

Nanoholes tetragonal and trigonal array as well as Al dots tetragonal and hexagonal array was successfully formed on Si substrate by the use of AFM nano-indentation and anodic oxidation. The ordered array of nanoholes could be obtained only at the indenting interval that depended on the anodic voltage. It should be notified that Al dots hexagonal array with the nearest neighbor distance of 34nm was formed. For further shrinkage of the Al dots, reduction of the indenting interval at an adequate anodic voltage would be necessary.