8.2: Invited Paper: High-Aperture-Ratio and Fault-Tolerant TFT-LCDs Using a-Si:H TFTs

摘要

One of the key factors to utilize high aperture-ratio cell structures for production of TFT-LCDs is the simplicity of the fabrication process based on the cost and the yield. A new TFT-LCD cell structure, having ring-shape storage capacitor electrodes with dual gate-lines, is effective to improve the aperture ratio and the production yield without drastic design rule changes or extra process steps. This paper describes a novel TFT-LCD cell structure using a-S:H TFTs that can result in higher aperture ratio and higher production yield.