First Results from a New 248 nm CD Measurement System for Future Mask and Reticle Generation

摘要

To keep pace with continuously shrinking design rules for masks and reticles a new 248 nm CD measurement system has been developed. The step to a shorter illumination wavelength leads to a better optical resolution power resulting in an improved CD linearity compared to systems using white light or I-line illumination for imaging. An overview of the system configuration is presented and first results of the improved optical performance as well as CD linearity and CD repeatability data are shown.