Visualization of Resist Flow Fields in UV-nanoimprint Lithography by Using Defocusing Digital Particle Image Velocimetry

摘要

The resist filling behaviour is crucial to the quality of the final imprinted pattern in NIL.To reveal the resist filling mechanism,a three-dimensional defocusing digital particle image velocimetry system was set up to realize the visualization of resist flow process.A set of three-dimensional particle tracking velocimetry (3D PTV) algorithm for motion trajectory and velocity vectors of specified particle sets is presented.Three-dimensional particle field and velocity field were plotted.The research results will help to understand the resist filling behavior.