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Fracture behaviors of thin superconducting films with field-dependent critical current density

机译:取决于电场的临界电流密度的超导薄膜的断裂行为

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摘要

The fracture behaviors under electromagnetic force with field-dependent critical current density in thin superconducting film are investigated. Applying finite element method, the stress intensity factors of one central crack versus applied field and crack length are obtained for the exponential model, which was compared with the Bean model and Kim model. This work can offer good estimations and provide a basis for interpretation of cracking and mechanical failure of HTS thin films in numerous real situations.
机译:研究了超导薄膜在电磁力作用下具有临界磁场强度的断裂行为。应用有限元方法,得到了指数模型的一个中心裂纹的应力强度因子与施加场和裂纹长度的关系,并与Bean模型和Kim模型进行了比较。这项工作可以提供良好的估计,并为解释HTS薄膜在许多实际情况下的破裂和机械故障提供基础。

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