首页> 外文会议>IEEE International Symposium on Compound Semiconductors >Low avalanche noise behaviour in bulk Al{sub}0.8Ga{sub}0.2As
【24h】

Low avalanche noise behaviour in bulk Al{sub}0.8Ga{sub}0.2As

机译:散装α{sub} 0.8ga {sub} 0.2as中的低雪崩噪声行为

获取原文

摘要

We report avalanche multiplication measurements on 1 μm thick bulk Al{sub}0.8Ga{sub}0.2As diodes which exhibit low excess noise. A series of homojunction p-i-n and n-i-p structures with very low dark currents of ~4μA/cm{sup}2 at 0.95 V{sub}(bd) were characterized. Photo-multiplication measurements suggest that M{sub}e>M{sub}h with a k value of ~0.2, smaller than those reported in other bulk III-V materials, such as GaAs, GaInP, Inp and Al{sub}xGa{sub}(1-x)As (x ≤ 0.6). Excess noise results corresponding to k≈0.15 were obtained for electron initiated multiplication. This broadly corroborates the multiplication measurements and suggests that even in these 1 μm thick structures some non-local ionization behaviour may be helping to further reduce the excess noise measured.
机译:我们在1μm厚的散装α{sub} 0.8ga {sub} 0.2as二极管上报告雪崩乘法测量。特征在于,在0.95V {Sub}(BD)下,一系列具有非常低的暗电流的同性全调P-I-N和N-I-P结构,其具有〜4μA/ cm} 2。光乘法测量表明,具有AK值的M {sub} {sub} h的〜0.2,小于其他散装III-V材料中报告的那些,例如GaAs,GaInP,InP和Al {Sub} XGA {子}(1-x)为(x≤0.6)。获得对应于K≈0.15的过量噪声结果,用于电子引发倍增。这广泛地证实了乘法测量,并表明即使在这些1μm厚的结构中,一些非局部电离行为可能有助于进一步降低测量的过量噪声。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号