首页> 外国专利> CARBOXYLIC ACID MODIFIED-NITRILE BASED COPOLYMER LATEX AND LATEX COMPOSITION FOR DIP-FORMING COMPRISING THE COPOLYMER LATEX AND ARTICLE FORMED BY THE COMPOSITION

CARBOXYLIC ACID MODIFIED-NITRILE BASED COPOLYMER LATEX AND LATEX COMPOSITION FOR DIP-FORMING COMPRISING THE COPOLYMER LATEX AND ARTICLE FORMED BY THE COMPOSITION

机译:羧酸MODIFIED-NITRILE共聚物为基础橡胶和乳胶浸渍成型的成分包括形成的共聚物乳胶和文章由组成

摘要

Disclosed is a latex composition for dip molding including a carboxylic acid-modified nitrile-based copolymer latex satisfying General Formula 1, wherein the carboxylic acid-modified nitrile-based copolymer includes: 15 wt % to 30 wt % of the ethylenic unsaturated nitrile-based monomer-derived unit and 2.5 wt % to 4.5 wt % of the ethylenic unsaturated acid monomer-derived unit, and a molded article:; 1.0 mm2/s≤CV0≤3.0 mm2/s.  General Formula 1
机译:

著录项

  • 公开/公告号US2022204732A1

    专利类型

  • 公开/公告日2022-06-30

    原文格式PDF

  • 申请/专利权人 LG CHEM LTD.;

    申请/专利号US202117606667

  • 申请日2021-02-08

  • 分类号C08L15;C08C19/04;

  • 国家

  • 入库时间 2023-06-25 23:55:29

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