METHOD FOR FILTERING POLISHING-ADDITIVE-CONTAINING LIQUID, POLISHING-ADDITIVE-CONTAINING LIQUID, POLISHING COMPOSITION, METHOD FOR PRODUCING POLISHING COMPOSITION, AND FILTER

摘要

Provided is a method for filtering an additive-containing liquid that can achieve a polishing composition exhibiting excellent defect reducing capability while maintaining a practical filter life. The method for filtering a polishing additive-containing liquid provided by the present invention includes the step of: filtering the polishing additive-containing liquid with a filter that satisfies the following conditions (1) and (2). (1) The average pore diameter P measured by a palm porometer is 0.15 µm or less. (2) The pore diameter gradient (Sin/Sout), which is the ratio of the inlet-side average pore diameter (Sin) to the outlet-side average pore diameter (Sout), both diameters being measured through observation with an SEM, is 3 or less.