/ METHOD FOR ACCURATELY DETERMINING THE THICKNESS AND/OR ELEMENTAL COMPOSITION OF SMALL FEATURES ON THIN-SUBSTRATES USING MICRO-XRF

摘要

The X-ray fluorescence (XRF) analysis method comprises applying an X-ray beam to the sample in a reference measurement in which a sample includes one or more first layers formed on a substrate and a target measurement after one or more second layers are formed on the substrate in addition to the first layer. and measuring the excited XRF signal from the sample to generate a reference XRF spectrum and a target XRF spectrum. The contribution of the first layer to the target XRF spectrum is reduced using the reference XRF spectrum. A parameter of at least one of the second layers is estimated using a reduced contribution target XRF spectrum of the first layer.