首页> 外国专利> NANO-TEXTURED ATTENUATOR FOR USE WITH LASER BEAM PROFILING AND LASER BEAM CHARACTERIZATION SYSTEMS AND METHOD OF USE

NANO-TEXTURED ATTENUATOR FOR USE WITH LASER BEAM PROFILING AND LASER BEAM CHARACTERIZATION SYSTEMS AND METHOD OF USE

机译:用于激光束轮廓和激光束表征系统的纳米结构衰减器及其使用方法

摘要

The present application discloses a nano-textured attenuator which includes a body defining in the aperture, a measurement aperture, at least one beam dump aperture, at least one coupling fixture may be formed on or positioned on the body, a first nano-textured beamsplitter is positioned within the body and configured to transmit 85% to 99.9999% of an input signal therethrough while reflecting 0.0001% to form at least one partially attenuated signal, at least a second nano-textured beamsplitter is positioned within the body and is configured to transmit 85% to 99.9999% of an input signal therethrough while reflecting 0.0001% to form at least one attenuated measurement signal, and at least one camera is communication with the measurement aperture be configured to measure at least one optical characteristic of the attenuated measurement signal.
机译:本申请公开了一种纳米结构衰减器,其包括限定在所述孔中的主体、测量孔、至少一个光束转储孔、可在所述主体上形成或定位至少一个耦合夹具,第一纳米纹理分束器位于主体内,并被配置为在其中传输85%至99.9999%的输入信号,同时反射0.0001%以形成至少一个部分衰减的信号,至少一个第二纳米纹理分束器位于主体内,并被配置为在反射0.0001%的同时传输85%至99.9999%的输入信号,以形成至少一个衰减的测量信号,以及至少一个相机与测量孔通信,该测量孔被配置为测量衰减的测量信号的至少一个光学特性。

著录项

  • 公开/公告号EP3987258A1

    专利类型

  • 公开/公告日2022-04-27

    原文格式PDF

  • 申请/专利权人 OPHIR-SPIRICON LLC;

    申请/专利号EP20200831625

  • 发明设计人 KIRKHAM KEVIN;FERREE KENNETH;

    申请日2020-06-18

  • 分类号G01J1/42;G01J1/04;

  • 国家 EP

  • 入库时间 2022-08-25 00:43:12

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