首页> 外国专利> A NEW CONSTRICTION CELL STRUCTURE AND FABRICATION METHOD WITH REDUCED PROGRAMMING CURRENT AND THERMAL CROSS TALK FOR 3D X-POINT MEMORY

A NEW CONSTRICTION CELL STRUCTURE AND FABRICATION METHOD WITH REDUCED PROGRAMMING CURRENT AND THERMAL CROSS TALK FOR 3D X-POINT MEMORY

机译:一种降低编程电流和热串扰的三维X点存储器压缩单元结构及制作方法

摘要

Systems, methods, and apparatus are provided to reduce current required to operate 3D memory cells, through configuration of geometry of memory cells, through etching and other methods. Thermal cross talks are reduced by using laminates and gap fillers between the memory cells, which in turn produce less heat and better isolating heat generated by a cell, which in turn allow for a smaller scale manufacture of memory cells. In a cell structure and process flow, PCM memory cells are shaped in a constriction shape by wet or dry process during line/space patterning in both X and Y directions. As a result, programming current density is the highest in the middle of the memory cell pillar to incur phase change and melting only in the middle of the cell pillar to stay away from both top and bottom electrodes for decreasing cross talks between adjacent cells.
机译:本发明提供了通过配置存储单元的几何形状、通过蚀刻和其他方法来减少操作3D存储单元所需的电流的系统、方法和装置。通过在存储单元之间使用层压板和间隙填充物来减少热串扰,从而减少单元产生的热量,更好地隔离单元产生的热量,进而允许更小规模的存储单元制造。在单元结构和工艺流程中,在X和Y方向的线/空间图案形成期间,PCM存储单元通过湿或干工艺形成收缩形状。因此,编程电流密度在存储单元柱中部最高,仅在单元柱中部发生相变和熔化,远离顶部和底部电极,以减少相邻单元之间的串扰。

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