The present invention relates to a supporter for an implant processor. A discharge vessel (10) that forms a double tube structure including an outer tube (11) and an inner tube (12) and is filled with a gas that generates UV light, and a discharge container ( The external electrode 20 disposed on the outer tube 11 of 10), and the inner electrode 20 disposed on the inner tube 12 of the discharge vessel 10 to form a hollow part 31 to accommodate the implant 1 ( 30), in the supporter 100 for an implant processor including, mounted on the hollow part 31 of the internal electrode 30, interlocked with the elevating means 40, and formed a first air hole 111 through the deep part, A fixture driver (2) coupled to the upper end of the arrangement unit (110) for distributing the air flowing into the hollow part (31) to the upper and lower sides so as to be integrally or detachably coupled to the implant (1) and fastened to the implant (1). Including the support part 120 for vertically inserting and fixing the implant 1, it is characterized in that it is configured to support the position and posture in a non-contact state with the implant 1, thereby minimizing contact while setting the implant.
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