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RUTHENIUM LINER AND CAP FOR BACK-END-OF-LINE APPLICATIONS
RUTHENIUM LINER AND CAP FOR BACK-END-OF-LINE APPLICATIONS
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机译:Ruthenium衬垫和帽用于后端的应用程序
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摘要
Electronic devices and methods of forming electronic devices using a ruthenium or doped ruthenium liner and cap layer are described. A liner with a ruthenium layer and a cobalt layer is formed on a barrier layer. A conductive fill forms a second conductive line in contact with the first conductive line.
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