GOLD SPRATED TARGET AND METHOD FOR ITS PRODUCTION

摘要

Provided is a gold sputtering target that makes it possible to improve the uniformity of the film thickness distribution of a highly pure Au film. The gold sputtering target has a gold purity of 99.999% or more. The average value of the Vickers hardness is 20 or more and less than 40 and the average crystal grain size is 15-200 µm in such a gold sputtering target. The {110} planes of the gold are preferentially oriented toward the surface to be sputtered.