首页> 外国专利> HIGH-UNIFORMITY CRYSTAL GROWTH METHOD AND APPARATUS WITHOUT ANNEALING

HIGH-UNIFORMITY CRYSTAL GROWTH METHOD AND APPARATUS WITHOUT ANNEALING

机译:高均匀性晶体生长方法和装置,无退火

摘要

A method for crystal growth, comprising subjecting each reaction material for growing an oxide crystal to a first pretreatment and then weighing the reaction material; after performing a pre-assembly treatment of at least one component of a crystal growth device, placing the reaction material that has been subjected to a second pretreatment into the crystal growth device, wherein the at least one component of the crystal growth device comprises a pot (214), and the pre-assembly treatment comprises subjecting the pot (214) to at least one of coating protection, acid bath washing, and foreign body cleaning; sealing the crystal growth device and then introducing a flowing gas into the interior of the crystal growth device; and adding in real time, a reaction material supplement into the crystal growth device during a crystal growth process.
机译:一种晶体生长的方法,包括使每个反应材料进行氧化物晶体,然后称重反应材料; 在进行预组装治疗后的晶体生长装置的至少一个组分后,将已经进行的第二预处理的反应材料放入晶体生长装置中,其中晶体生长装置的至少一个组分包括罐 (214)和预组装处理包括使罐(214)进行涂层保护,酸浴洗涤和异物清洁中的至少一种; 密封晶体生长装置,然后将流动气体引入晶体生长装置的内部; 并在实时加入,在晶体生长过程中将反应材料补充到晶体生长装置中。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号