PHOTO-CURABLE RESIN COMPOSITION FOR USE IN STEREOLITHOGRAPHY

摘要

Provided herein is a curable liquid stereolithography resin comprising (a) a divinylarene dioxide, such as for example a divinylbenene dioxide (DVBDO); (b) a free radically curable component, such as for example a (meth)acrylate component; (c) a cationic photoinitiator; and (d) a free radical photoinitiator. The stereolithography resin may comprise additional components, such as a cationically curable component other than a divinylarene dioxide. Preferably, the stereolithography resin has a viscosity at 25°C of less than 400 mPa·s.