首页> 外国专利> Compositions comprising ammonia activated siloxanes for avoiding pattern collapse when processing patterned materials having line spacing dimensions of 50 nm or less

Compositions comprising ammonia activated siloxanes for avoiding pattern collapse when processing patterned materials having line spacing dimensions of 50 nm or less

机译:包含氨活化硅氧烷的组合物,用于在处理具有50nm或更小的线间距尺寸的图案材料时避免图案塌陷

摘要

A non-aqueous composition comprising: (a) an organic protic solvent, (b) ammonia, and (c) at least one additive of formula (I) or (II), during the meal, R 1 is H R 2 is selected from H, C 1 to C 10 alkyl, C 1 to C 10 alkoxy, C 6 to C 10 aryl, and C 6 to C 10 aroxy; R 3 is selected from R 2 , R 4 is selected from C 1 to C 10 alkyl, C 1 to C 10 alkoxy, C 6 to C 10 aryl, and C 6 to C 10 aroxy; R 10 , R 12 are independently selected from C 1 to C 10 alkyl and C 1 to C 10 alkoxy; m is 1, 2 or 3; n is 0 or an integer from 1 to 100.
机译:包含:(a)有机质粒溶剂,(b)氨,和(c)在膳食期间,r 1期间的式(I)或(ii)的至少一种添加剂是HR 2 H,C 1至C 10烷基,C 1至C 10烷氧基,C 6至C 10芳基,C 6至C 10芳环; R 3选自R 2,R 4选自C 1至C 10烷基,C 1至C 10烷氧基,C 6至C 10芳基,C 6至C 10芳氧基; R 10,R 12独立地选自C 1至C 10烷基,C 1至C 10烷氧基; m是1,2或3; n为0或从1到100的整数。

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