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Compositions comprising ammonia activated siloxanes for avoiding pattern collapse when processing patterned materials having line spacing dimensions of 50 nm or less
Compositions comprising ammonia activated siloxanes for avoiding pattern collapse when processing patterned materials having line spacing dimensions of 50 nm or less
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机译:包含氨活化硅氧烷的组合物,用于在处理具有50nm或更小的线间距尺寸的图案材料时避免图案塌陷
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摘要
A non-aqueous composition comprising: (a) an organic protic solvent, (b) ammonia, and (c) at least one additive of formula (I) or (II), during the meal, R 1 is H R 2 is selected from H, C 1 to C 10 alkyl, C 1 to C 10 alkoxy, C 6 to C 10 aryl, and C 6 to C 10 aroxy; R 3 is selected from R 2 , R 4 is selected from C 1 to C 10 alkyl, C 1 to C 10 alkoxy, C 6 to C 10 aryl, and C 6 to C 10 aroxy; R 10 , R 12 are independently selected from C 1 to C 10 alkyl and C 1 to C 10 alkoxy; m is 1, 2 or 3; n is 0 or an integer from 1 to 100.
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