An object of the present invention is to provide a cylindrical sputtering target with little deformation and high strength, a cylindrical sintered body, a cylindrical shaped body, and a method for manufacturing the same. Another object of the present invention is to provide a cylindrical sputtering target with high homogeneity, a cylindrical sintered body, a cylindrical shaped body, and a method for manufacturing the same. The sputtering target by one Embodiment of this invention has a cylindrical sintered compact, The relative density of a cylindrical sintered compact is 99.7 % or more and 99.9 % or less. In addition, the cylindrical sputtering target has a plurality of cylindrical sintered bodies adjacent to each other through a predetermined space, and the difference in relative density between the adjacent plurality of cylindrical sintered bodies may be 0.1% or less.
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