Chemically amplified positive type photosensitive resin composition, manufacturing method of photosensitive dry film, photosensitive dry film, method of manufacturing patterned resist film, manufacturing method of substrate with mold, manufacturing method of plating molding, and mercapto compound

摘要

To provide: a chemically amplified positive photosensitive resin composition capable of suppressing occurrence of "footing", in which a width of a bottom (a side proximal to the surface of a support) becomes narrower than a top (a side proximal to the surface of a resist layer) in a non-resist portion when a resist pattern serving as a template for a plated shaped article is formed on a metal surface of a substrate having a metal surface using the chemically amplified positive photosensitive resin composition; a photosensitive dry film; a method for producing the photosensitive dry film; a method for producing a patterned resist film; a method for producing the substrate provided with the template; and a method for producing a plated shaped product using the substrate provided with the template.SOLUTION: A chemically amplified positive photosensitive resin composition includes an acid generator (A) which generates acid upon exposure to an active ray or radiation; a resin (B) whose solubility in alkali increases by the action of acid; and a mercapto compound with a structure of formula (C1) in the figure.SELECTED DRAWING: None