Decomposition and removal agent for fluorine-containing gas, manufacturing method thereof, fluorine-containing gas removal method using the same, and method for recovering fluorine resources

摘要

Fluorine-containing gases, especially perfluoro compounds (PFCs) used for etching and dry cleaning of CVD equipment in the production of semiconductors, etc., can be efficiently decomposed without adding water or oxygen, and fluorine is removed as an alkaline earth fluoride To provide a removal agent immobilized in the interior, a manufacturing method thereof, a fluorine-containing gas removal method using the same, and a method for recovering fluorine resources. The above object is a fluorine-containing degassing agent containing alumina and an alkaline earth metal compound, wherein the ammonia desorption curve by the ammonia TPD-MS method having a mass charge ratio of 15 has a peak in the range of less than 200 ° C., and 200 ° C. or higher It is addressed by a fluorine-containing degassing agent, having a shoulder in scope.