APPARATUS FOR SUPPLYING TREATMENT LIQUID AND METHOD OF SUPPLYING TREATMENT LIQUID

摘要

An object of the present invention is to use a single filter 52 to purify the resist liquid L while suppressing a decrease in throughput when discharging the resist liquid L, which is a processing liquid, from the discharge nozzle 7 . is to promote A filter 52 and a pump 70 or pumps 111 and 112 are provided in the supply pipe 51 through which the resist liquid L flows. Then, a part of the resist liquid L that has passed through the filter 52 is discharged from the discharge nozzle 7, and the remaining resist liquid L is returned to the primary side of the filter 52, followed by discharge. During operation, the remaining resist solution L is passed through the filter 52 again. In this operation sequence, the return amount of the resist liquid L returned to the primary side of the filter 52 is equal to or greater than the supply amount of the resist liquid L discharged from the discharge nozzle 7 . set to increase.