首页> 外国专利> Method for manufacturing a group III-nitride crystal comprising supplying a group III-element oxide gas and a nitrogen element-containing gas at a supersaturation ratio of greater than 1 and equal to or less than 5

Method for manufacturing a group III-nitride crystal comprising supplying a group III-element oxide gas and a nitrogen element-containing gas at a supersaturation ratio of greater than 1 and equal to or less than 5

机译:制备III-氮化物晶体的方法,包括以大于1且等于或小于5的过饱和率供应III元素氧化物气体和含氮元素的气体

摘要

A method of manufacturing a group-III nitride crystal includes: preparing a seed substrate; and supplying a group-III element oxide gas and a nitrogen element-containing gas at a supersaturation ratio (Po/Pe) greater than 1 and equal to or less than 5, then, growing a group-III nitride crystal on the seed substrate, wherein the Po is a supply partial pressure of the group-III element oxide gas, and the Pe is an equilibrium partial pressure of the group-III element oxide gas.
机译:制备基团-III族氮化物晶体的方法包括:制备种子基质; 以大于1且等于或小于5,然后在种子基质上生长在种子底物上的含量比(PO / PE)的含有III元素氧化物气体和含氮元素的气体,而不是5,然后在种子底物上生长III族氮化物晶体, 其中PO是III族元素氧化物气体的供应分压,PE是III族元素氧化物气体的平衡分压。

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