首页> 外国专利> METHOD AND APPARATUS FOR MANUFACTURING MICROFLUIDIC CHIP WITH FEMTOSECOND PLASMA GRATING

METHOD AND APPARATUS FOR MANUFACTURING MICROFLUIDIC CHIP WITH FEMTOSECOND PLASMA GRATING

机译:用飞秒等离子体光栅制造微流体芯片的方法和装置

摘要

The present disclosure discloses a method and apparatus for manufacturing a microfluidic chip with a femtosecond plasma grating. The method is characterized in that two or more beams of femtosecond pulse laser act on quartz glass together at a certain included angle and converge in the quartz glass, and when pulses achieve synchronization in time domain, the two optical pulses interfere; Benefited by constraint of an interference field, only one optical filament is formed in one interference period; and numbers of optical filaments are arranged equidistantly in space to form the plasma grating. The apparatus for manufacturing the microfluidic chip includes a plasma grating optical path, a microchannel processing platform, and a hydrofluoric acid ultrasonic cell.
机译:本公开公开了一种用于制造具有飞秒等离子体光栅的微流体芯片的方法和装置。 该方法的特征在于,在石英玻璃上的两个或更多个飞秒脉冲激光器在一定的角度下一起作用并在石英玻璃中收敛,并且当脉冲在时域中实现同步时,两个光脉冲干扰; 受益于干扰场的约束,在一个干扰时段中仅形成一个光纤; 并且光纤的数量在空间中等距布置,以形成等离子体光栅。 用于制造微流体芯片的装置包括等离子体光栅光路,微通道加工平台和氢氟酸超声波电池。

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