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Electrical connecting structure having nano-twins copper and method of forming the same

机译:具有纳米孪晶铜的电连接结构和形成相同的方法

摘要

Disclosed herein is a method of forming an electrical connecting structure having nano-twins copper. The method includes the steps of (i) forming a first nano-twins copper layer including a plurality of nano-twins copper grains; (ii) forming a second nano-twins copper layer including a plurality of nano-twins copper grains; and (iii) joining a surface of the first nano-twins copper layer with a surface of the second nano-twins copper layer, such that at least a portion of the first nano-twins copper grains grow into the second nano-twins copper layer, or at least a portion of the second nano-twins copper grains grow into the first nano-twins copper layer. An electrical connecting structure having nano-twins copper is provided as well.
机译:本文公开了一种形成具有纳米双胞胎铜的电连接结构的方法。 该方法包括(i)的步骤,其形成包括多个纳米双胞胎铜颗粒的第一纳米双胞胎铜层; (ii)形成第二纳米双胞胎铜层,包括多个纳米双胞胎铜颗粒; (iii)用第二纳米双胞胎铜层的表面加入第一纳米双胞胎铜层的表面,使得第一纳米双胞胎铜颗粒的至少一部分生长到第二纳米双胞胎铜层中 ,或者至少一部分第二纳米双胞胎铜晶粒生长到第一纳米孪子铜层中。 提供具有纳米双胞胎铜的电连接结构。

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