首页> 外国专利> SUBSTRATE FOR POLYMER BRUSH FORMATION, PRODUCTION METHOD FOR SUBSTRATE FOR POLYMER BRUSH FORMATION, AND PRECURSOR LIQUID FOR USE IN PRODUCTION METHOD FOR SUBSTRATE FOR POLYMER BRUSH FORMATION

SUBSTRATE FOR POLYMER BRUSH FORMATION, PRODUCTION METHOD FOR SUBSTRATE FOR POLYMER BRUSH FORMATION, AND PRECURSOR LIQUID FOR USE IN PRODUCTION METHOD FOR SUBSTRATE FOR POLYMER BRUSH FORMATION

机译:用于聚合物刷形成的基材,用于聚合物刷形成的基材的制备方法,以及用于聚合物刷形成的底物的生产方法中的前体液体

摘要

The purpose of the present invention is to provide a surface treatment technology that makes it possible to give excellent surface functionality to surfaces of a variety of large-area substrate materials. According to the present invention, when precursor solution containing an organosilane and a metal alkoxide is coated on a substrate material to form a polymerization initiator layer by a sol-gel process, a polymerization initiator group-containing organosilane having a formula: X-R1-(Ph)k-(R2)m-Si-R3nR43-n(X stands for a halogen atom, R1stands for an alkylene group having 1 to 3 carbon atoms, Ph stands for a phenylene group, R2stands for a C1 to C10 alkylene group optionally via an oxygen atom, R3stands for an alkoxy or chloro group having 1 to 3 carbon atoms, R4stands for an alkyl group having 1 to 6 carbon atoms, k is 0 or 1, m is 0 or 1, and n is 1, 2 or 3) is used as the organosilane.
机译:本发明的目的是提供一种表面处理技术,其使得可以提供优异的表面官能度与各种大面积基板材料的表面。 根据本发明,当含有有机硅烷和金属醇盐的前体溶液通过溶胶 - 凝胶工艺涂覆在基板材料上以形成聚合引发剂层时,具有公式的聚合引发剂基团的有机硅烷:X-R1- (pH)K-(R2)M-Si-R3NR43-N(X代表卤素原子,对于具有1至3个碳原子的亚烷基的R1架,pH代表亚苯基代表C1至C10亚烷基的R2抵抗力 任选地通过氧原子,具有1至3个碳原子的烷氧基或氯基团的R 3架,具有1至6个碳原子的烷基的R4处于0或1,m为0或1,N为1,2 或3)用作有机硅烷。

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