PARAMETER ANALYSIS METHOD AND DEVICE OF MASK PLATE

摘要

A parameter analysis method and device of a mask plate. The method comprises: obtaining detection parameters of at least one mask pattern, the detection parameters comprising deviation coordinates between measured coordinates of each alignment mark in a mask pattern prepared by a mask plate and preset coordinates of each alignment mark in a layout of the mask pattern; obtaining, according to the detection parameters, the direction and vector length of a deviation vector of the deviation coordinates of each alignment mark in the mask pattern; and generating quality analysis data of the mask plate according to the direction and vector length of the deviation vector of each alignment mark in the mask pattern. According to the method, operation is simple, efficiency is high, and the accuracy of the generated analysis data is high.