NOVEL TUNGSTEN-BASED THERMAL-SPRAYED COATING AND THERMAL-SPRAYING MATERIAL FOR OBTAINING THE SAME

摘要

Provided are: a novel tungsten-based thermal-sprayed coating suitable as a member for a plasma etching device that uses a halogen gas; and a thermal-spraying material for obtaining the thermal-sprayed coating.　The thermal-sprayed coating is characterized by containing tungsten as a matrix phase and containing an oxide including silicon and boron as a dispersed phase. The plasma etching device member has this thermal-sprayed coating. The thermal-spraying material is characterized by including 1 to 7 wt% of silicon, 0.5 to 3 wt% of boron, and tungsten and unavoidable impurities as the balance. A method for producing the thermal-sprayed coating includes spraying the thermal-spraying material.