METHOD TO PRODUCE GRAPHENE AND METAL-GRAPHENE COMPOSITE FILMS USING MICROPLASMA-BASED SYNTHESIS

摘要

In one aspect, the disclosure relates to relates to processes for preparing graphene and/or metal-graphene films. In one aspect, the processes are scalable and produce uniform films of controlled thickness. In another aspect, the processes result in films having properties similar to sublimated graphene but lacking the pitting associated with sublimated graphene and further, the processes can be carried out without the precise temperature controls needed for the sublimation process. In still another aspect, the processes result in graphene and metal-graphene films having atomic-level surface roughness useful in a variety of applications including, but not limited to, sensors and detectors, catalytic processes, advanced materials, and the like. This abstract is intended as a scanning tool for purposes of searching in the particular art and is not intended to be limiting of the present disclosure.