DEVICE FOR MONITORING BEAM TREATMENT OF A WORKPIECE AND USE THEREOF, DEVICE FOR BEAM TREATMENT OF A WORKPIECE AND USE THEREOF, METHOD FOR MONITORING BEAM TREATMENT OF A WORKPIECE, METHOD FOR BEAM TREATMENT OF A WORKPIECE

摘要

A device and a method for monitoring beam treatment of a workpiece are provided. The device includes at least one illuminating device (12) for illuminating a treatment region of the workpiece during first time intervals; a detecting device (15) for detecting an electromagnetic radiation emanating from the treatment region; and a processing device (19) for separate processing of the electromagnetic radiation detected within the first and within second time intervals. Moreover, a device and a method for laser beam treatment of a workpiece are provided.