Diblock copolymer containing gradient random-copolymer block and method for forming fine pattern using diblock copolymer

摘要

Disclosed are a double block copolymer including a block having a concentration gradient and a method of forming a fine pattern using the same. A block copolymer according to an embodiment of the present invention includes a first block; and a second block comprising a random copolymer having a concentration gradient, wherein the first block comprises polymethyl methacrylate (PMMA), and the second block is styrene ( S) and a random copolymer having a pentafluorostyrene (PFS) concentration gradient.